Pdms-Bonded Photolithography Biochip for Cell Culture and Shear Stress Research

Product Description

Photolithography Engineered Chips & Bio-MEMS Foundry (Support OEM/ODM)

· Product Description

 

  ZEGOTA's Photolithography Engineered Chips are state-of-the-art microfluidic, electrode, and sensor-based platforms engineered for next-generation (NGS) genetic analysis, molecular diagnostics, and advanced Bio-MEMS. Specializing in high-resolution semiconductor-grade projection photolithography (Stepper Lithography) and precision dry/wet etching, we deliver mass-producible sub-micron and micro-scale structures with flawless geometric fidelity.
  Leveraging semiconductor-grade fabrication lines and advanced surface functionalization, ZEGOTA provides a fully integrated OEM/ODM pipeline-spanning from photomask design and optical prototyping to automated, high-volume wafer foundry production. Our lithography-driven platforms ensure world-class surface uniformity, extreme chemical resistance, and precise micro/nano-channel fidelity required for massive parallel processing and single-molecule level biological detection.
 

· Core Technical Advantages & Global Benchmark

 

Sub-Micron Photolithography Precision: Utilizing state-of-the-art i-line/DUV stepper lithography and high-precision laser direct writing, we achieve critical feature sizes ≤350mm. This matches international tier-1 standards for advanced microfluidic channel networks and metal micro-electrode arrays (MEAs).
Ultra-High Multi-Layer Alignment (Overlay): We support multi-mask alignment processes with an overlay accuracy of ≤100mm. This enables highly complex, multi-tier hybrid microfluidic structures and integrated CMOS-on-chip diagnostic sensors.
Advanced Deep Etching & High Aspect Ratio: Equipped with Deep Reactive Ion Etching (DRIE) for silicon and optimized wet etching for quartz/glass, we produce channels with aspect ratios up to 20:1. Thick-film SU-8 photolithography is also fully supported for high-aspect-ratio microstructure replication.

Flawless Surface Chemistry: We offer top-tier molecular surface modification (CVD/liquid phase), including uniform PEGylation, aminosilane alignment, and streptavidin immobilization. Our surface uniformity variation is kept within ± 2%, minimizing non-specific binding and optimizing biomolecule capturing.
Class 10/100 Cleanroom Yellow Rooms: All photolithography, exposure, development, and inspection processes are executed in ultra-strict Class 10/100 localized clean zones inside our Class 10k/100k GMP environments, guaranteeing zero-dust patterning and excellent fluidic consistency.
 

· Target Applications

 

Our photolithography-engineered chips and specialized foundry services power critical global life-science and microfluidic sectors:
Next-Generation Sequencing (NGS) & Arrays: Photolithographed high-density flow cells and patterned micro-well arrays optimized for DNA cluster amplification.
Micro-Electrode Arrays (MEAs): Ultra-fine gold, platinum, or chrome electrode patterns on quartz/glass/silicon for cellular electrophysiology and neural signal recording.
Molecular Diagnostics & Droplet dPCR: Precision high-aspect-ratio microfluidic chips designed for digital PCR partitioning and droplet-based Point-of-Care Testing (POCT).
Organ-on-a-Chip & Bio-MEMS: Multi-layered micro-channel networks replicating complex physiological environments for drug screening.
 

· Product Parameters (Benchmarked to Tier-1 Standards)

 

Capability Item	Description / International Standard Specs
Primary Technology	High-Resolution Stepper Photolithography, Laser Direct Writing, Silicon DRIE, Glass/Quartz Wet Etching
Chip Substrates	Silicon-based, Quartz-based, Soda-lime Glass, Borosilicate Glass, and SU-8/PDMS/COP polymers
Exposure Resolution (CD)	≤ 350mm (Sub-micron features, ultra-fine electrode pitches, micropillar arrays)
Overlay Alignment Accuracy	≤ 100mm (For complex multi-mask, multi-layer microfluidic structures)
Etching Aspect Ratio	Up to 20:1 (Silicon DRIE); Etching depth uniformity variation ≤± 2%
Surface Modification	Hydrophilic/Hydrophobic tuning, PEGylation, Silanization, Biotin-Streptavidin coating
Cleanroom Standard	Class 10/100 Photolithography Yellow Rooms, GMP Class 10,000 packaging
Quality Management	ISO 13485:2016 (Medical Devices Quality), FDA Registered, CE Compliant
Foundry Service Model	Mask Design→ Photo-masking →Lithography & Etching → Dicing → Surface Functionalization → Assembly

· Brief Introduction

 

  Zhejiang ZEGOTA Precision Technology Co., Ltd. is a premier, technology-driven pioneer specializing in high-precision semiconductor-grade micro and nanofabrication. Armed with industry-leading projection photolithography systems, advanced etch tools, and a world-class multidisciplinary R&D team, ZEGOTA provides customized foundry services that meet the rigorous demands of global diagnostics, genomics, and precision medicine.
  By unifying photomask design, precision lithography, deep etching, surface chemistry, and volume production under one roof, we do not just supply hardware-we accelerate the commercialization of next-generation biotechnology worldwide.