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| Customization: | Available |
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| Certification: | CE, ISO |
| Application: | Rubber, Plastic, Chemical, Ceramic, Glass |
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| Capability Item | Description / International Standard Specs |
| Primary Technology | Advanced Nanoimprint Lithography (NIL), Hybrid Photolithography, CVD Surface Engineering |
| Chip Architectures | Silicon-based, Glass-based, Quartz-based, and Polymer (COC/COP/PMMA) chips |
| NIL Resolution (Feature Size) | ≤20nm (Nanopore arrays, nano-channels, nano-gaps, ZMW arrays) |
| CD Uniformity (Wafer-level) | Within ±3% across standard 6-inch / 8-inch substrates |
| Surface Modification | Hydrophilic/Hydrophobic tuning, PEGylation, Silanization, Biotin-Streptavidin coating |
| Cleanroom Standard | Class 100 localized, Class 10k/100k facility, GMP Class 10,000 |
| Quality Management | ISO 13485:2016 (Medical Devices Quality), FDA Registered, CE Compliant |
| Foundry Service Model | Concept R&D → NIL Mold Making → Prototype → Pilot → High-Volume OEM |