Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research

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  • Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
  • Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
  • Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
  • Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
  • Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
  • Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
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Basic Info.

Model NO.
NIL Chips
Material
Silicon Dioxide,Sin,
Model
Customized
Breadth Depth Ratio
Customized
Accuracy
6inch
Transport Package
Carton Packaging
Specification
Customized
Trademark
ZEGOTA
Origin
China
HS Code
8542399000
Production Capacity
100000 PCS/Month

Product Description

Nanoimprint Engineered Chip
Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
 

 

· Product Description

ZEGOTA's Gene Sequencing Chips are state-of-the-art microfluidic and nanopore-based platforms engineered for next-generation (NGS) and third-generation (TGS) genetic analysis. Specializing in high-throughput Nanoimprint Lithography (NIL) , we break the cost-and-scaling barriers of traditional photolithography, delivering mass-producible sub-20nm feature sizes with absolute structural fidelity.
Leveraging semiconductor-grade fabrication and advanced surface functionalization, ZEGOTA provides a fully integrated OEM/ODM pipeline-spanning from structural prototyping and pilot testing to automated, high-volume foundry production. Our NIL-driven platforms ensure world-class surface uniformity, extreme chemical resistance, and precise micro/nano-channel fidelity required for single-molecule accuracy and massive parallel processing.
 

· Core Technical Advantages & Global Benchmark


Next-Gen Nanoimprint (NIL) Mastery: Our proprietary nanoimprint replication technology achieves critical feature sizes $\le 20\text{ nm}$ (with an active R&D capability down to $10\text{ nm}$ for ultra-dense nanopore arrays). This matches and exceeds the specifications of international tier-1 sequencing flow cells, ensuring maximum cluster density and optical/electrical signal SNR.

Hybrid Multi-Process Integration: We seamlessly combine large-scale photolithography (for microfluidic supply channels) with ultra-precise nanoimprint lithography (for nanoscale capturing zones) under one roof. This allows for complex, multi-tier hybrid structures (e.g., micro-flows integrated with nano-gaps) that single-technology vendors cannot manufacture.

Flawless Surface Chemistry: We offer top-tier molecular surface modification (CVD/liquid phase), including uniform PEGylation, aminosilane alignment, and streptavidin immobilization. Our surface uniformity variation is kept within $\pm 2\%$, minimizing non-specific binding and optimizing DNA/RNA polymerase anchoring.

Semiconductor-Grade Cleanrooms: Produced in ultra-strict Class 10/100 localized clean zones inside our Class 10k/100k GMP environments, guaranteeing zero particulate defect rates and strict fluidic consistency.
 

· Target Applications


Our NIL-engineered sequencing chips and specialized foundry services power critical global life-science sectors:
Next-Generation Sequencing (NGS): Ultra-high-density patterned flow cells optimized for massive bridge amplification clusters.
Third-Generation Sequencing (TGS): Nanopore arrays and Single-Molecule Real-Time (SMRT) sequencing zero-mode waveguide (ZMW) arrays.
Molecular Diagnostics & POCT: Precision micro-nano hybrid fluidic chips for fast sample processing and digital PCR (dPCR) partitioning.
Organ-on-a-Chip & Bio-MEMS: Biomimetic nanostructure channels replicating extracellular matrices for advanced toxicity screening.
 

· Product Parameters (Benchmarked to Tier-1 Standards)

Capability Item Description / International Standard Specs
Primary Technology Advanced Nanoimprint Lithography (NIL), Hybrid Photolithography, CVD Surface Engineering
Chip Architectures Silicon-based, Glass-based, Quartz-based, and Polymer (COC/COP/PMMA) chips
NIL Resolution (Feature Size) 20nm (Nanopore arrays, nano-channels, nano-gaps, ZMW arrays)
CD Uniformity (Wafer-level) Within ±3% across standard 6-inch / 8-inch substrates
Surface Modification Hydrophilic/Hydrophobic tuning, PEGylation, Silanization, Biotin-Streptavidin coating
Cleanroom Standard Class 100 localized, Class 10k/100k facility, GMP Class 10,000
Quality Management ISO 13485:2016 (Medical Devices Quality), FDA Registered, CE Compliant
Foundry Service Model Concept R&D  NIL Mold Making   Prototype  Pilot   High-Volume OEM
Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research

 

Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research
Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research



· Brief Introduction

  Zhejiang ZEGOTA Precision Technology Co., Ltd. is a premier, technology-driven pioneer specializing in high-precision semiconductor-grade micro and nanofabrication. Armed with industry-leading Nanoimprint Lithography (NIL) technology and a world-class multidisciplinary R&D team, ZEGOTA provides customized foundry services that meet the rigorous demands of precision medicine and genomic healthcare.
  By unifying structural design, mold nano-fabrication, surface functionalization, and high-volume replication under one roof , we do not just supply hardware-we accelerate the commercialization of next-generation biotechnology worldwide.


   
Ready-to-Use Flexible Replication Stamp Kit for Laboratory Nanoimprint Biochip Research

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